The NSF Public Access Repository (PAR) system and access will be unavailable from 11:00 PM ET on Thursday, January 16 until 2:00 AM ET on Friday, January 17 due to maintenance. We apologize for the inconvenience.
Explore Research Products in the PAR It may take a few hours for recently added research products to appear in PAR search results.
Feng, Xunda, Tousley, Marissa E., Cowan, Matthew G., Wiesenauer, Brian R., Nejati, Siamak, Choo, Youngwoo, Noble, Richard D., Elimelech, Menachem, Gin, Douglas L., and Osuji, Chinedum O. Scalable Fabrication of Polymer Membranes with Vertically Aligned 1 nm Pores by Magnetic Field Directed Self-Assembly. ACS Nano 8.12 Web. doi:10.1021/nn505037b.
Feng, Xunda, Tousley, Marissa E., Cowan, Matthew G., Wiesenauer, Brian R., Nejati, Siamak, Choo, Youngwoo, Noble, Richard D., Elimelech, Menachem, Gin, Douglas L., & Osuji, Chinedum O. Scalable Fabrication of Polymer Membranes with Vertically Aligned 1 nm Pores by Magnetic Field Directed Self-Assembly. ACS Nano, 8 (12). https://doi.org/10.1021/nn505037b
Feng, Xunda, Tousley, Marissa E., Cowan, Matthew G., Wiesenauer, Brian R., Nejati, Siamak, Choo, Youngwoo, Noble, Richard D., Elimelech, Menachem, Gin, Douglas L., and Osuji, Chinedum O.
"Scalable Fabrication of Polymer Membranes with Vertically Aligned 1 nm Pores by Magnetic Field Directed Self-Assembly". ACS Nano 8 (12). United States: American Chemical Society. https://doi.org/10.1021/nn505037b.https://par.nsf.gov/biblio/10000836.
@article{osti_10000836,
place = {United States},
title = {Scalable Fabrication of Polymer Membranes with Vertically Aligned 1 nm Pores by Magnetic Field Directed Self-Assembly},
url = {https://par.nsf.gov/biblio/10000836},
DOI = {10.1021/nn505037b},
abstractNote = {Not Available},
journal = {ACS Nano},
volume = {8},
number = {12},
publisher = {American Chemical Society},
author = {Feng, Xunda and Tousley, Marissa E. and Cowan, Matthew G. and Wiesenauer, Brian R. and Nejati, Siamak and Choo, Youngwoo and Noble, Richard D. and Elimelech, Menachem and Gin, Douglas L. and Osuji, Chinedum O.},
}
Warning: Leaving National Science Foundation Website
You are now leaving the National Science Foundation website to go to a non-government website.
Website:
NSF takes no responsibility for and exercises no control over the views expressed or the accuracy of
the information contained on this site. Also be aware that NSF's privacy policy does not apply to this site.