Yang, Yurong, Ren, Wei, Stengel, Massimiliano, Yan, X. H., and Bellaiche, L. Revisiting Properties of Ferroelectric and Multiferroic Thin Films under Tensile Strain from First Principles. Physical Review Letters 109.5 Web. doi:10.1103/PhysRevLett.109.057602.
Yang, Yurong, Ren, Wei, Stengel, Massimiliano, Yan, X. H., & Bellaiche, L. Revisiting Properties of Ferroelectric and Multiferroic Thin Films under Tensile Strain from First Principles. Physical Review Letters, 109 (5). https://doi.org/10.1103/PhysRevLett.109.057602
Yang, Yurong, Ren, Wei, Stengel, Massimiliano, Yan, X. H., and Bellaiche, L.
"Revisiting Properties of Ferroelectric and Multiferroic Thin Films under Tensile Strain from First Principles". Physical Review Letters 109 (5). United States: American Physical Society. https://doi.org/10.1103/PhysRevLett.109.057602.https://par.nsf.gov/biblio/10004570.
@article{osti_10004570,
place = {United States},
title = {Revisiting Properties of Ferroelectric and Multiferroic Thin Films under Tensile Strain from First Principles},
url = {https://par.nsf.gov/biblio/10004570},
DOI = {10.1103/PhysRevLett.109.057602},
abstractNote = {Not Available},
journal = {Physical Review Letters},
volume = {109},
number = {5},
publisher = {American Physical Society},
author = {Yang, Yurong and Ren, Wei and Stengel, Massimiliano and Yan, X. H. and Bellaiche, L.},
}
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