McConnell, Michael S., Schneider, Louisa C., Karbasian, Golnaz, Rouvimov, Sergei, Orlov, Alexei O., and Snider, Gregory L. Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction. Retrieved from https://par.nsf.gov/biblio/10018262. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34.1 Web. doi:10.1116/1.4937992.

McConnell, Michael S., Schneider, Louisa C., Karbasian, Golnaz, Rouvimov, Sergei, Orlov, Alexei O., & Snider, Gregory L. Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 34 (1). Retrieved from https://par.nsf.gov/biblio/10018262. https://doi.org/10.1116/1.4937992

McConnell, Michael S., Schneider, Louisa C., Karbasian, Golnaz, Rouvimov, Sergei, Orlov, Alexei O., and Snider, Gregory L. "Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (1). Country unknown/Code not available. https://doi.org/10.1116/1.4937992. https://par.nsf.gov/biblio/10018262.

@article{osti_10018262,
place = {Country unknown/Code not available}, title = {Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction}, url = {https://par.nsf.gov/biblio/10018262}, DOI = {10.1116/1.4937992}, abstractNote = {}, journal = {Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, volume = {34}, number = {1}, author = {McConnell, Michael S. and Schneider, Louisa C. and Karbasian, Golnaz and Rouvimov, Sergei and Orlov, Alexei O. and Snider, Gregory L.}, }