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Title: Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth
Authors:
; ; ;
Publication Date:
NSF-PAR ID:
10020090
Journal Name:
APL Materials
Volume:
4
Issue:
8
Page Range or eLocation-ID:
086111
ISSN:
2166-532X
Publisher:
American Institute of Physics
Sponsoring Org:
National Science Foundation
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