Gallardo, Patricio A., Koopman, Brian J., Cothard, Nicholas F., Bruno, Sarah Marie M., Cortes-Medellin, German, Marchetti, Galen, Miller, Kevin H., Mockler, Brenna, Niemack, Michael D., Stacey, Gordon, and Wollack, Edward J. Deep reactive ion etched anti-reflection coatings for sub-millimeter silicon optics. Applied Optics 56.10 Web. doi:10.1364/AO.56.002796.

Gallardo, Patricio A., Koopman, Brian J., Cothard, Nicholas F., Bruno, Sarah Marie M., Cortes-Medellin, German, Marchetti, Galen, Miller, Kevin H., Mockler, Brenna, Niemack, Michael D., Stacey, Gordon, & Wollack, Edward J. Deep reactive ion etched anti-reflection coatings for sub-millimeter silicon optics. Applied Optics, 56 (10). https://doi.org/10.1364/AO.56.002796

Gallardo, Patricio A., Koopman, Brian J., Cothard, Nicholas F., Bruno, Sarah Marie M., Cortes-Medellin, German, Marchetti, Galen, Miller, Kevin H., Mockler, Brenna, Niemack, Michael D., Stacey, Gordon, and Wollack, Edward J. "Deep reactive ion etched anti-reflection coatings for sub-millimeter silicon optics". Applied Optics 56 (10). Country unknown/Code not available: Optical Society of America. https://doi.org/10.1364/AO.56.002796. https://par.nsf.gov/biblio/10024004.

@article{osti_10024004,
place = {Country unknown/Code not available}, title = {Deep reactive ion etched anti-reflection coatings for sub-millimeter silicon optics}, url = {https://par.nsf.gov/biblio/10024004}, DOI = {10.1364/AO.56.002796}, abstractNote = {Not Available}, journal = {Applied Optics}, volume = {56}, number = {10}, publisher = {Optical Society of America}, author = {Gallardo, Patricio A. and Koopman, Brian J. and Cothard, Nicholas F. and Bruno, Sarah Marie M. and Cortes-Medellin, German and Marchetti, Galen and Miller, Kevin H. and Mockler, Brenna and Niemack, Michael D. and Stacey, Gordon and Wollack, Edward J.}, }