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Title: Controlling silicon crystallization in aluminum-induced crystallization via substrate plasma treatment
Authors:
 ;  ;  ;  
Publication Date:
NSF-PAR ID:
10024299
Journal Name:
Journal of Applied Physics
Volume:
121
Issue:
11
Page Range or eLocation-ID:
115301
ISSN:
0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
National Science Foundation