Mills, Edmund M., Kleine-Boymann, Matthias, Janek, Juergen, Yang, Hao, Browning, Nigel D., Takamura, Yayoi, and Kim, Sangtae. YSZ thin films with minimized grain boundary resistivity. Retrieved from https://par.nsf.gov/biblio/10024794. Phys. Chem. Chem. Phys. 18.15 Web. doi:10.1039/c5cp08032k.

Mills, Edmund M., Kleine-Boymann, Matthias, Janek, Juergen, Yang, Hao, Browning, Nigel D., Takamura, Yayoi, & Kim, Sangtae. YSZ thin films with minimized grain boundary resistivity. Phys. Chem. Chem. Phys., 18 (15). Retrieved from https://par.nsf.gov/biblio/10024794. https://doi.org/10.1039/c5cp08032k

Mills, Edmund M., Kleine-Boymann, Matthias, Janek, Juergen, Yang, Hao, Browning, Nigel D., Takamura, Yayoi, and Kim, Sangtae. "YSZ thin films with minimized grain boundary resistivity". Phys. Chem. Chem. Phys. 18 (15). Country unknown/Code not available. https://doi.org/10.1039/c5cp08032k. https://par.nsf.gov/biblio/10024794.

@article{osti_10024794,
place = {Country unknown/Code not available}, title = {YSZ thin films with minimized grain boundary resistivity}, url = {https://par.nsf.gov/biblio/10024794}, DOI = {10.1039/c5cp08032k}, abstractNote = {}, journal = {Phys. Chem. Chem. Phys.}, volume = {18}, number = {15}, author = {Mills, Edmund M. and Kleine-Boymann, Matthias and Janek, Juergen and Yang, Hao and Browning, Nigel D. and Takamura, Yayoi and Kim, Sangtae}, }