Emori, Satoru, Gray, Benjamin A., Jeon, Hyung-Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng-Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, and Howe, Brandon M. Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films. Advanced Materials 29.34 Web. doi:10.1002/adma.201701130.

Emori, Satoru, Gray, Benjamin A., Jeon, Hyung-Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng-Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, & Howe, Brandon M. Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films. Advanced Materials, 29 (34). https://doi.org/10.1002/adma.201701130

Emori, Satoru, Gray, Benjamin A., Jeon, Hyung-Min, Peoples, Joseph, Schmitt, Maxwell, Mahalingam, Krishnamurthy, Hill, Madelyn, McConney, Michael E., Gray, Matthew T., Alaan, Urusa S., Bornstein, Alexander C., Shafer, Padraic, N'Diaye, Alpha T., Arenholz, Elke, Haugstad, Greg, Meng, Keng-Yuan, Yang, Fengyuan, Li, Dongyao, Mahat, Sushant, Cahill, David G., Dhagat, Pallavi, Jander, Albrecht, Sun, Nian X., Suzuki, Yuri, and Howe, Brandon M. "Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films". Advanced Materials 29 (34). Germany: Wiley Blackwell (John Wiley & Sons). https://doi.org/10.1002/adma.201701130. https://par.nsf.gov/biblio/10027370.

@article{osti_10027370,
place = {Germany}, title = {Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films}, url = {https://par.nsf.gov/biblio/10027370}, DOI = {10.1002/adma.201701130}, abstractNote = {Not Available}, journal = {Advanced Materials}, volume = {29}, number = {34}, publisher = {Wiley Blackwell (John Wiley & Sons)}, author = {Emori, Satoru and Gray, Benjamin A. and Jeon, Hyung-Min and Peoples, Joseph and Schmitt, Maxwell and Mahalingam, Krishnamurthy and Hill, Madelyn and McConney, Michael E. and Gray, Matthew T. and Alaan, Urusa S. and Bornstein, Alexander C. and Shafer, Padraic and N'Diaye, Alpha T. and Arenholz, Elke and Haugstad, Greg and Meng, Keng-Yuan and Yang, Fengyuan and Li, Dongyao and Mahat, Sushant and Cahill, David G. and Dhagat, Pallavi and Jander, Albrecht and Sun, Nian X. and Suzuki, Yuri and Howe, Brandon M.}, }