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Title: Low-Temperature Atomic Layer Deposition of MoS 2 Films
NSF-PAR ID:
10035410
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  ;  ;  ;  
Publisher / Repository:
Wiley Blackwell (John Wiley & Sons)
Date Published:
Journal Name:
Angewandte Chemie International Edition
Volume:
56
Issue:
18
ISSN:
1433-7851
Page Range / eLocation ID:
4991 to 4995
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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