Low-Temperature Atomic Layer Deposition of MoS 2 Films
- NSF-PAR ID:
- 10035410
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Angewandte Chemie International Edition
- Volume:
- 56
- Issue:
- 18
- ISSN:
- 1433-7851
- Page Range / eLocation ID:
- 4991 to 4995
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation