- NSF-PAR ID:
- 10050438
- Publisher / Repository:
- American Vacuum Society
- Date Published:
- Journal Name:
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
- Volume:
- 36
- Issue:
- 2
- ISSN:
- 2166-2746
- Page Range / eLocation ID:
- 02D102
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Secondary‐ion mass spectrometry (SIMS) is used to determine impurity concentrations of carbon and oxygen in two scandium‐containing nitride semiconductor multilayer heterostructures: Sc
x Ga1−x N/GaN and Scx Al1−x N/AlN grown by molecular beam epitaxy (MBE). In the Scx Ga1−x N/GaN heterostructure grown in metal‐rich conditions on GaN–SiC template substrates with Sc contents up to 28 at%, the oxygen concentration is found to be below 1 × 1019 cm−3, with an increase directly correlated with the scandium content. In the Scx Al1−x N–AlN heterostructure grown in nitrogen‐rich conditions on AlN–Al2O3template substrates with Sc contents up to 26 at%, the oxygen concentration is found to be between 1019and 1021 cm−3, again directly correlated with the Sc content. The increase in oxygen and carbon takes place during the deposition of scandium‐alloyed layers.