Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. Applied Physics Letters 106.3 Web. doi:10.1063/1.4906419.

Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., & Brock, J. D. Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?. Applied Physics Letters, 106 (3). https://doi.org/10.1063/1.4906419

Sullivan, M. C., Ward, M. J., Gutiérrez-Llorente, Araceli, Adler, Eli R., Joress, H., Woll, A., and Brock, J. D. "Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?". Applied Physics Letters 106 (3). United States: American Institute of Physics. https://doi.org/10.1063/1.4906419. https://par.nsf.gov/biblio/10051677.

@article{osti_10051677,
place = {United States}, title = {Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?}, url = {https://par.nsf.gov/biblio/10051677}, DOI = {10.1063/1.4906419}, abstractNote = {Not Available}, journal = {Applied Physics Letters}, volume = {106}, number = {3}, publisher = {American Institute of Physics}, author = {Sullivan, M. C. and Ward, M. J. and Gutiérrez-Llorente, Araceli and Adler, Eli R. and Joress, H. and Woll, A. and Brock, J. D.}, }