skip to main content


Title: Band alignment at epitaxial BaSnO3/SrTiO3(001) and BaSnO3/LaAlO3(001) heterojunctions
NSF-PAR ID:
10052000
Author(s) / Creator(s):
 ;  ;  ;  ;  
Publisher / Repository:
American Institute of Physics
Date Published:
Journal Name:
Applied Physics Letters
Volume:
108
Issue:
15
ISSN:
0003-6951
Page Range / eLocation ID:
152104
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. null (Ed.)
  2. Abstract Background/objectives

    While outcomes for pediatric T‐cell acute lymphoblastic leukemia (T‐ALL) are favorable, there are few widely accepted prognostic factors, limiting the ability to risk stratify therapy.

    Design/methods

    Dana‐Farber Cancer Institute (DFCI) Protocols 05‐001 and 11‐001 enrolled pediatric patients with newly diagnosed B‐ or T‐ALL from 2005 to 2011 and from 2012 to 2015, respectively. Protocol therapy was nearly identical for patients with T‐ALL (N = 123), who were all initially assigned to the high‐risk arm. End‐induction minimal residual disease (MRD) was assessed by reverse transcription polymerase chain reaction (RT‐PCR) or next‐generation sequencing (NGS), but was not used to modify postinduction therapy. Early T‐cell precursor (ETP) status was determined by flow cytometry. Cases with sufficient diagnostic DNA were retrospectively evaluated by targeted NGS of known genetic drivers of T‐ALL, including Notch, PI3K, and Ras pathway genes.

    Results

    The 5‐year event‐free survival (EFS) and overall survival (OS) for patients with T‐ALL was 81% (95% CI, 73‐87%) and 90% (95% CI, 83‐94%), respectively. ETP phenotype was associated with failure to achieve complete remission, but not with inferior OS. Low end‐induction MRD (<10−4) was associated with superior disease‐free survival (DFS). Pathogenic mutations of the PI3K pathway were mutually exclusive of ETP phenotype and were associated with inferior 5‐year DFS and OS.

    Conclusions

    Together, our findings demonstrate that ETP phenotype, end‐induction MRD, and PI3K pathway mutation status are prognostically relevant in pediatric T‐ALL and should be considered for risk classification in future trials. DFCI Protocols 05‐001 and 11‐001 are registered atwww.clinicaltrials.govas NCT00165087 and NCT01574274, respectively.

     
    more » « less
  3. Dry oxidation of Si (001) beneath a thin epitaxial SrTiO3 layer has been studied using furnace annealing in flowing oxygen. A 10-nm layer of SrTiO3 is epitaxially grown on Si with no SiO2 interlayer. For such a structure, an annealing temperature of 800 °C was found to be the limiting temperature to prevent silicate formation and disruption of the interface structure. The effect of annealing time on the thickness of the SiO2 layer was investigated. In situ x-ray photoelectron spectroscopy and reflection-high-energy electron diffraction were used to ensure that the quality of SrTiO3 is unchanged after the annealing process. The experimental annealing data are compared with a theoretical oxygen diffusion model based on that of Deal, Grove, and Massoud. The model fits the experimental data well, indicating that oxygen diffusion through the SrTiO3 layer is not the limiting factor. One can therefore readily control the thickness of the SiO2 interlayer by simply controlling the annealing time in flowing oxygen.

     
    more » « less