Sridhar, Shyam, Liu, Lei, Hirsch, Emilia W., Donnelly, Vincent M., and Economou, Demetre J. Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34.6 Web. doi:10.1116/1.4964641.

Sridhar, Shyam, Liu, Lei, Hirsch, Emilia W., Donnelly, Vincent M., & Economou, Demetre J. Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 34 (6). https://doi.org/10.1116/1.4964641

Sridhar, Shyam, Liu, Lei, Hirsch, Emilia W., Donnelly, Vincent M., and Economou, Demetre J. "Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (6). United States: American Vacuum Society. https://doi.org/10.1116/1.4964641. https://par.nsf.gov/biblio/10052898.

@article{osti_10052898,
place = {United States}, title = {Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy}, url = {https://par.nsf.gov/biblio/10052898}, DOI = {10.1116/1.4964641}, abstractNote = {Not Available}, journal = {Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, volume = {34}, number = {6}, publisher = {American Vacuum Society}, author = {Sridhar, Shyam and Liu, Lei and Hirsch, Emilia W. and Donnelly, Vincent M. and Economou, Demetre J.}, }