Sycks, Dalton G., Wu, Tiffany, Park, Hyun Sang, and Gall, Ken. Tough, stable spiroacetal thiol-ene resin for 3D printing: Research Article. Journal of Applied Polymer Science 135.22 Web. doi:10.1002/app.46259.

Sycks, Dalton G., Wu, Tiffany, Park, Hyun Sang, & Gall, Ken. Tough, stable spiroacetal thiol-ene resin for 3D printing: Research Article. Journal of Applied Polymer Science, 135 (22). https://doi.org/10.1002/app.46259

Sycks, Dalton G., Wu, Tiffany, Park, Hyun Sang, and Gall, Ken. "Tough, stable spiroacetal thiol-ene resin for 3D printing: Research Article". Journal of Applied Polymer Science 135 (22). United States: Wiley Blackwell (John Wiley & Sons). https://doi.org/10.1002/app.46259. https://par.nsf.gov/biblio/10054051.

@article{osti_10054051,
place = {United States}, title = {Tough, stable spiroacetal thiol-ene resin for 3D printing: Research Article}, url = {https://par.nsf.gov/biblio/10054051}, DOI = {10.1002/app.46259}, abstractNote = {Not Available}, journal = {Journal of Applied Polymer Science}, volume = {135}, number = {22}, publisher = {Wiley Blackwell (John Wiley & Sons)}, author = {Sycks, Dalton G. and Wu, Tiffany and Park, Hyun Sang and Gall, Ken}, }