Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High- k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride
                        
                    - Award ID(s):
- 1706388
- PAR ID:
- 10061255
- Date Published:
- Journal Name:
- ECS Journal of Solid State Science and Technology
- Volume:
- 6
- Issue:
- 10
- ISSN:
- 2162-8769
- Page Range / eLocation ID:
- N189 to N208
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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