Low temperature synthesis of high quality two-dimensional (2D) materials directly on flexible substrates remains a fundamental limitation towards scalable realization of robust flexible electronics possessing the unique physical properties of atomically thin structures. Herein, we describe room temperature sputtering of uniform, stoichiometric amorphous MoS 2 and subsequent large area (>6.25 cm 2 ) photonic crystallization of 5 nm 2H-MoS 2 films in air to enable direct, scalable fabrication of ultrathin 2D photodetectors on stretchable polydimethylsiloxane (PDMS) substrates. The lateral photodetector devices demonstrate an average responsivity of 2.52 μW A −1 and a minimum response time of 120 ms under 515.6 nm illumination. Additionally, the surface wrinkled, or buckled, PDMS substrate with conformal MoS 2 retained the photoconductive behavior at tensile strains as high as 5.72% and over 1000 stretching cycles. The results indicate that the photonic crystallization method provides a significant advancement in incorporating high quality semiconducting 2D materials applied directly on polymer substrates for wearable and flexible electronic systems.
Additive manufacturing of patterned 2D semiconductor through recyclable masked growth
The 2D van der Waals crystals have shown great promise as potential future electronic materials due to their atomically thin and smooth nature, highly tailorable electronic structure, and mass production compatibility through chemical synthesis. Electronic devices, such as field effect transistors (FETs), from these materials require patterning and fabrication into desired structures. Specifically, the scale up and future development of “2D”-based electronics will inevitably require large numbers of fabrication steps in the patterning of 2D semiconductors, such as transition metal dichalcogenides (TMDs). This is currently carried out via multiple steps of lithography, etching, and transfer. As 2D devices become more complex (e.g., numerous 2D materials, more layers, specific shapes, etc.), the patterning steps can become economically costly and time consuming. Here, we developed a method to directly synthesize a 2D semiconductor, monolayer molybdenum disulfide (MoS2), in arbitrary patterns on insulating SiO2/Si via seed-promoted chemical vapor deposition (CVD) and substrate engineering. This method shows the potential of using the prepatterned substrates as a master template for the repeated growth of monolayer MoS2patterns. Our technique currently produces arbitrary monolayer MoS2patterns at a spatial resolution of 2 μm with excellent homogeneity and transistor performance (room temperature electron mobility of 30 cm2V−1s−1and on–off current more »
- Publication Date:
- NSF-PAR ID:
- 10085774
- Journal Name:
- Proceedings of the National Academy of Sciences
- Volume:
- 116
- Issue:
- 9
- Page Range or eLocation-ID:
- p. 3437-3442
- ISSN:
- 0027-8424
- Publisher:
- Proceedings of the National Academy of Sciences
- Sponsoring Org:
- National Science Foundation
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