Low pressure chemical vapor deposition of β-Ga 2 O 3 thin films: Dependence on growth parameters
- Award ID(s):
- 1755479
- NSF-PAR ID:
- 10090795
- Date Published:
- Journal Name:
- APL Materials
- Volume:
- 7
- Issue:
- 2
- ISSN:
- 2166-532X
- Page Range / eLocation ID:
- 022514
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation