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Title: Low pressure chemical vapor deposition of β-Ga 2 O 3 thin films: Dependence on growth parameters
Award ID(s):
1755479
NSF-PAR ID:
10090795
Author(s) / Creator(s):
; ;
Date Published:
Journal Name:
APL Materials
Volume:
7
Issue:
2
ISSN:
2166-532X
Page Range / eLocation ID:
022514
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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