Mohimi, Elham, Chu, Xiaoqing I., Trinh, Brian B., Babar, Shaista, Girolami, Gregory S., and Abelson, John R. Thermal Atomic Layer Etching of Copper by Sequential Steps Involving Oxidation and Exposure to Hexafluoroacetylacetone. Retrieved from https://par.nsf.gov/biblio/10097542. ECS Journal of Solid State Science and Technology 7.9 Web. doi:10.1149/2.0211809jss.

Mohimi, Elham, Chu, Xiaoqing I., Trinh, Brian B., Babar, Shaista, Girolami, Gregory S., & Abelson, John R. Thermal Atomic Layer Etching of Copper by Sequential Steps Involving Oxidation and Exposure to Hexafluoroacetylacetone. ECS Journal of Solid State Science and Technology, 7 (9). Retrieved from https://par.nsf.gov/biblio/10097542. https://doi.org/10.1149/2.0211809jss

Mohimi, Elham, Chu, Xiaoqing I., Trinh, Brian B., Babar, Shaista, Girolami, Gregory S., and Abelson, John R. "Thermal Atomic Layer Etching of Copper by Sequential Steps Involving Oxidation and Exposure to Hexafluoroacetylacetone". ECS Journal of Solid State Science and Technology 7 (9). Country unknown/Code not available. https://doi.org/10.1149/2.0211809jss. https://par.nsf.gov/biblio/10097542.

@article{osti_10097542,
place = {Country unknown/Code not available}, title = {Thermal Atomic Layer Etching of Copper by Sequential Steps Involving Oxidation and Exposure to Hexafluoroacetylacetone}, url = {https://par.nsf.gov/biblio/10097542}, DOI = {10.1149/2.0211809jss}, abstractNote = {}, journal = {ECS Journal of Solid State Science and Technology}, volume = {7}, number = {9}, author = {Mohimi, Elham and Chu, Xiaoqing I. and Trinh, Brian B. and Babar, Shaista and Girolami, Gregory S. and Abelson, John R.}, }