Wu, Jiazhen, Lu, Erdong, Li, Jiang, Lu, Yangfan, Kitano, Masaaki, Fredrickson, Daniel C., Inoshita, Takeshi, and Hosono, Hideo. Pseudogap Control of Physical and Chemical Properties in CeFeSi-Type Intermetallics. Retrieved from https://par.nsf.gov/biblio/10106047. Inorganic Chemistry 58.4 Web. doi:10.1021/acs.inorgchem.8b03539.

Wu, Jiazhen, Lu, Erdong, Li, Jiang, Lu, Yangfan, Kitano, Masaaki, Fredrickson, Daniel C., Inoshita, Takeshi, & Hosono, Hideo. Pseudogap Control of Physical and Chemical Properties in CeFeSi-Type Intermetallics. Inorganic Chemistry, 58 (4). Retrieved from https://par.nsf.gov/biblio/10106047. https://doi.org/10.1021/acs.inorgchem.8b03539

Wu, Jiazhen, Lu, Erdong, Li, Jiang, Lu, Yangfan, Kitano, Masaaki, Fredrickson, Daniel C., Inoshita, Takeshi, and Hosono, Hideo. "Pseudogap Control of Physical and Chemical Properties in CeFeSi-Type Intermetallics". Inorganic Chemistry 58 (4). Country unknown/Code not available. https://doi.org/10.1021/acs.inorgchem.8b03539. https://par.nsf.gov/biblio/10106047.

@article{osti_10106047,
place = {Country unknown/Code not available}, title = {Pseudogap Control of Physical and Chemical Properties in CeFeSi-Type Intermetallics}, url = {https://par.nsf.gov/biblio/10106047}, DOI = {10.1021/acs.inorgchem.8b03539}, abstractNote = {}, journal = {Inorganic Chemistry}, volume = {58}, number = {4}, author = {Wu, Jiazhen and Lu, Erdong and Li, Jiang and Lu, Yangfan and Kitano, Masaaki and Fredrickson, Daniel C. and Inoshita, Takeshi and Hosono, Hideo}, }