Atomic Layer Deposited TiO 2 –IrO x Alloys Enable Corrosion Resistant Water Oxidation on Silicon at High Photovoltage
- Award ID(s):
- 1805084
- PAR ID:
- 10107113
- Date Published:
- Journal Name:
- Chemistry of Materials
- Volume:
- 31
- Issue:
- 1
- ISSN:
- 0897-4756
- Page Range / eLocation ID:
- 90 to 100
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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