Vijayamohanan, Harikrishnan, Bhide, Parth, Boyd, Dante, Zhou, Zhe, Palermo, Edmund F., and Ullal, Chaitanya K. Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists. Retrieved from https://par.nsf.gov/biblio/10111141. Langmuir 35.11 Web. doi:10.1021/acs.langmuir.8b03304.

Vijayamohanan, Harikrishnan, Bhide, Parth, Boyd, Dante, Zhou, Zhe, Palermo, Edmund F., & Ullal, Chaitanya K. Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists. Langmuir, 35 (11). Retrieved from https://par.nsf.gov/biblio/10111141. https://doi.org/10.1021/acs.langmuir.8b03304

Vijayamohanan, Harikrishnan, Bhide, Parth, Boyd, Dante, Zhou, Zhe, Palermo, Edmund F., and Ullal, Chaitanya K. "Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists". Langmuir 35 (11). Country unknown/Code not available. https://doi.org/10.1021/acs.langmuir.8b03304. https://par.nsf.gov/biblio/10111141.

@article{osti_10111141,
place = {Country unknown/Code not available}, title = {Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists}, url = {https://par.nsf.gov/biblio/10111141}, DOI = {10.1021/acs.langmuir.8b03304}, abstractNote = {}, journal = {Langmuir}, volume = {35}, number = {11}, author = {Vijayamohanan, Harikrishnan and Bhide, Parth and Boyd, Dante and Zhou, Zhe and Palermo, Edmund F. and Ullal, Chaitanya K.}, }