Using epoxy-based lithography to probe confinement effects on active nematics
- Award ID(s):
- 1808926
- PAR ID:
- 10124339
- Date Published:
- Journal Name:
- Proc. SPIE 11092, Liquid Crystals XXIII
- Page Range / eLocation ID:
- 13
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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