Littlejohn, Aaron J., Li, Zhaodong, Lu, Zonghuan, Sun, Xin, Nawarat, Poomirat, Wang, Yiping, Li, Yang, Wang, Tianmeng, Chen, Yanwen, Zhang, Lihua, Li, Hongxia, Kisslinger, Kim, Shi, Sufei, Shi, Jian, Raeliarijaona, Aldo, Shi, Wenqing, Terrones, Humberto, Lewis, Kim M., Washington, Morris, Lu, Toh-Ming, and Wang, Gwo-Ching. Large Metallic Vanadium Disulfide Ultrathin Flakes for Spintronic Circuits and Quantum Computing Devices. Retrieved from https://par.nsf.gov/biblio/10128915. ACS Applied Nano Materials 2.6 Web. doi:10.1021/acsanm.9b00608.

Littlejohn, Aaron J., Li, Zhaodong, Lu, Zonghuan, Sun, Xin, Nawarat, Poomirat, Wang, Yiping, Li, Yang, Wang, Tianmeng, Chen, Yanwen, Zhang, Lihua, Li, Hongxia, Kisslinger, Kim, Shi, Sufei, Shi, Jian, Raeliarijaona, Aldo, Shi, Wenqing, Terrones, Humberto, Lewis, Kim M., Washington, Morris, Lu, Toh-Ming, & Wang, Gwo-Ching. Large Metallic Vanadium Disulfide Ultrathin Flakes for Spintronic Circuits and Quantum Computing Devices. ACS Applied Nano Materials, 2 (6). Retrieved from https://par.nsf.gov/biblio/10128915. https://doi.org/10.1021/acsanm.9b00608

Littlejohn, Aaron J., Li, Zhaodong, Lu, Zonghuan, Sun, Xin, Nawarat, Poomirat, Wang, Yiping, Li, Yang, Wang, Tianmeng, Chen, Yanwen, Zhang, Lihua, Li, Hongxia, Kisslinger, Kim, Shi, Sufei, Shi, Jian, Raeliarijaona, Aldo, Shi, Wenqing, Terrones, Humberto, Lewis, Kim M., Washington, Morris, Lu, Toh-Ming, and Wang, Gwo-Ching. "Large Metallic Vanadium Disulfide Ultrathin Flakes for Spintronic Circuits and Quantum Computing Devices". ACS Applied Nano Materials 2 (6). Country unknown/Code not available. https://doi.org/10.1021/acsanm.9b00608. https://par.nsf.gov/biblio/10128915.

@article{osti_10128915,
place = {Country unknown/Code not available}, title = {Large Metallic Vanadium Disulfide Ultrathin Flakes for Spintronic Circuits and Quantum Computing Devices}, url = {https://par.nsf.gov/biblio/10128915}, DOI = {10.1021/acsanm.9b00608}, abstractNote = {}, journal = {ACS Applied Nano Materials}, volume = {2}, number = {6}, author = {Littlejohn, Aaron J. and Li, Zhaodong and Lu, Zonghuan and Sun, Xin and Nawarat, Poomirat and Wang, Yiping and Li, Yang and Wang, Tianmeng and Chen, Yanwen and Zhang, Lihua and Li, Hongxia and Kisslinger, Kim and Shi, Sufei and Shi, Jian and Raeliarijaona, Aldo and Shi, Wenqing and Terrones, Humberto and Lewis, Kim M. and Washington, Morris and Lu, Toh-Ming and Wang, Gwo-Ching}, }