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Title: Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
PAR ID:
10132513
Author(s) / Creator(s):
 ;  ;  ;  
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A
Volume:
38
Issue:
2
ISSN:
0734-2101
Page Range / eLocation ID:
Article No. 023009
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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