Volatile Etch Species Produced during Thermal Al 2 O 3 Atomic Layer Etching
- Award ID(s):
- 1800584
- PAR ID:
- 10143210
- Date Published:
- Journal Name:
- The Journal of Physical Chemistry C
- Volume:
- 124
- Issue:
- 1
- ISSN:
- 1932-7447
- Page Range / eLocation ID:
- 287 to 299
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
An official website of the United States government

