Sang, Xia, Chen, Ernest, and Chang, Jane P. Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing. Journal of Vacuum Science & Technology A 38.4 Web. doi:10.1116/6.0000190.

Sang, Xia, Chen, Ernest, & Chang, Jane P. Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing. Journal of Vacuum Science & Technology A, 38 (4). https://doi.org/10.1116/6.0000190

Sang, Xia, Chen, Ernest, and Chang, Jane P. "Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing". Journal of Vacuum Science & Technology A 38 (4). Country unknown/Code not available: American Vacuum Society. https://doi.org/10.1116/6.0000190. https://par.nsf.gov/biblio/10166001.

@article{osti_10166001,
place = {Country unknown/Code not available}, title = {Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing}, url = {https://par.nsf.gov/biblio/10166001}, DOI = {10.1116/6.0000190}, abstractNote = {Not Available}, journal = {Journal of Vacuum Science & Technology A}, volume = {38}, number = {4}, publisher = {American Vacuum Society}, author = {Sang, Xia and Chen, Ernest and Chang, Jane P.}, }