Lami, Sarah K., Kaphle, Amrit P., Briot, Nicolas J., Botman, Aurélien, and Todd Hastings, J. Nanoscale focused electron beam induced etching of nickel using a liquid reactant. Nanotechnology 31.42 Web. doi:10.1088/1361-6528/ab9fb4.

Lami, Sarah K., Kaphle, Amrit P., Briot, Nicolas J., Botman, Aurélien, & Todd Hastings, J. Nanoscale focused electron beam induced etching of nickel using a liquid reactant. Nanotechnology, 31 (42). https://doi.org/10.1088/1361-6528/ab9fb4

Lami, Sarah K., Kaphle, Amrit P., Briot, Nicolas J., Botman, Aurélien, and Todd Hastings, J. "Nanoscale focused electron beam induced etching of nickel using a liquid reactant". Nanotechnology 31 (42). Country unknown/Code not available: IOP Publishing. https://doi.org/10.1088/1361-6528/ab9fb4. https://par.nsf.gov/biblio/10175871.

@article{osti_10175871,
place = {Country unknown/Code not available}, title = {Nanoscale focused electron beam induced etching of nickel using a liquid reactant}, url = {https://par.nsf.gov/biblio/10175871}, DOI = {10.1088/1361-6528/ab9fb4}, abstractNote = {Not Available}, journal = {Nanotechnology}, volume = {31}, number = {42}, publisher = {IOP Publishing}, author = {Lami, Sarah K. and Kaphle, Amrit P. and Briot, Nicolas J. and Botman, Aurélien and Todd Hastings, J.}, }