Zeng, Minxiang, Kuang, Wenzheng, Khan, Irfan, Huang, Dali, Du, Yipu, Saeidi‐Javash, Mortaza, Zhang, Lecheng, Cheng, Zhengdong, Hoffman, Anthony J., and Zhang, Yanliang. Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials. Retrieved from https://par.nsf.gov/biblio/10197005. Advanced Materials 32.39 Web. doi:10.1002/adma.202003081.

Zeng, Minxiang, Kuang, Wenzheng, Khan, Irfan, Huang, Dali, Du, Yipu, Saeidi‐Javash, Mortaza, Zhang, Lecheng, Cheng, Zhengdong, Hoffman, Anthony J., & Zhang, Yanliang. Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials. Advanced Materials, 32 (39). Retrieved from https://par.nsf.gov/biblio/10197005. https://doi.org/10.1002/adma.202003081

Zeng, Minxiang, Kuang, Wenzheng, Khan, Irfan, Huang, Dali, Du, Yipu, Saeidi‐Javash, Mortaza, Zhang, Lecheng, Cheng, Zhengdong, Hoffman, Anthony J., and Zhang, Yanliang. "Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials". Advanced Materials 32 (39). Country unknown/Code not available. https://doi.org/10.1002/adma.202003081. https://par.nsf.gov/biblio/10197005.

@article{osti_10197005,
place = {Country unknown/Code not available}, title = {Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials}, url = {https://par.nsf.gov/biblio/10197005}, DOI = {10.1002/adma.202003081}, abstractNote = {}, journal = {Advanced Materials}, volume = {32}, number = {39}, author = {Zeng, Minxiang and Kuang, Wenzheng and Khan, Irfan and Huang, Dali and Du, Yipu and Saeidi‐Javash, Mortaza and Zhang, Lecheng and Cheng, Zhengdong and Hoffman, Anthony J. and Zhang, Yanliang}, }