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  • Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi x N films through composition tuning
Title: Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi x N films through composition tuning
Award ID(s):
1908167
PAR ID:
10197109
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  ;  ;  
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A
Volume:
38
Issue:
6
ISSN:
0734-2101
Page Range / eLocation ID:
Article No. 062404
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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