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			<titleStmt><title level='a'>New Device Physics of Cross-Gap Electroluminescence in Unipolar-Doped InGaAs/AlAs RTDs</title></titleStmt>
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				<date>2019 3rd Quarter (CY)</date>
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				<bibl> 
					<idno type="par_id">10199510</idno>
					<idno type="doi">10.1109/DRC46940.2019.9046392</idno>
					<title level='j'>2019 Device Research Conference (DRC)</title>
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					<author>P. Fakhimi</author><author>W-D. Zhang</author><author>T. A. Growden</author><author>E.R. Brown</author><author>R. Droopad</author><author>K.M. Hansen</author><author>P. R. Berger</author>
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			<abstract><ab><![CDATA[Double barrier resonant tunneling diodes (DBRTDs) exhibit a characteristic negative differential resistance (NDR), which allows for high-speed oscillation and switching; e.g. In0.53Ga0.47As/AlAs DBRTDs for high-speed oscillation applications [1, 2]. Recently, a cross-gap electroluminescence (EL) phenomenon from InGaAs DBRTDs at room temperature was discovered despite the absence of p-doped layers [3]. This unipolar-doped EL had not been previously reported in the past 40 + years of RTD history. The indispensable holes for the light emission are thought to be produced by interband tunneling through the narrow bandgap of In0.53Ga0.47As, which is illustrated in Fig. 1. The radiative recombination is thought to occur primarily in the In0.53Ga0.47As emitter region, and thus the emission spectrum is near the bandgap of In0.53Ga0.47As (~1650 nm at 295 K). The EL property combined with high-speed modulation can be utilized for future high-speed optical clocking applications. In this abstract we report a more detailed characterization of unipolar-doped In0.53Ga0.47As/AlAs DBRTDs to gain a better understanding of the new EL phenomenon.The heterostructure was grown by molecular beam epitaxy (MBE) on a semi-insulating InP substrate. The heterostructure stack has a 4.4 nm thick unintentionally doped (UID) In0.53Ga0.47As quantum well and 2.4 nm UID AlAs barriers on either side [Fig. 2 (a)]. The device shown in Fig. 2 (b) was fabricated using four mask levels. The first mask level defined a 15 µm mesa. The mesas were etched, using inductively coupled plasma reactive ion etching (ICP-RIE) with a BCl3 gas mixture, down to the highly doped In0.53Ga0.47As bottom contact layer in the collector region. The second mask layer was used to isolate the individual devices. A conformal passivating SiO2 layer was then deposited using plasma enhanced chemical vapor deposition (PECVD). Contact vias were defined and etched with a CF4 gas mixture using ICP-RIE through the SiO2 layer with the third mask. The last mask was utilized to deposit the contact pads. The annular top (5 µm aperture) contact design allowed for more light to escape from the surface.The characterizations entailed the following measurements: (1) current-voltage (I-V); (2) light emission intensity versus bias voltage (L-V); (3) EL spectrum; (4) shot noise; and (5) EL temperature dependence. Fig. 3 shows the measured I-V and the L-V curves at T ≈ 300 K. The onset of NDR is at 2.2 V with a peak-to-valley ratio of ~8.3. The EL has a threshold at a lower voltage (~1.25 V). Fig. 4 shows both the full shot noise and the total RTD noise power spectral density of the In0.53Ga0.47As/AlAs DBRTD device at T ≈ 300K. The low shot noise at biases >3V into the second positive differential resistance (PDR) region supports our thesis that the holes for the light emission are produced by interband tunneling, not impact ionization [4]. Fig. 5 shows an overlay plot of the normalized EL spectra of an RTD biased at 3.5 V with peaks marked and the theoretically modeled bandgap of In0.53Ga0.47As at various temperatures. The consistency between the theoretical model and measured bandgap corresponding to the spectra peak further supports the theory that describes the light emission as being cross-gap, radiative recombination in the InGaAs emitter [Fig. 5, Fig. 1]. The decreasing trend in full width at half maxima (FWHM) with a decrease in temperature could be due to a reduction in phonon scattering [Fig. 6] [5]. The preliminary external quantum efficiency (EQE) measurements resulted in an EQE of ~0.44% for unipolar-doped In0.53Ga0.47As/AlAs DBRTDs. Balancing the electron resonant and interband tunneling currents via tunneling engineering can result in substantially improved EQEs.]]></ab></abstract>
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