Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., and Engstrom, James R.. Area-selective atomic layer deposition enabled by competitive adsorption. Journal of Vacuum Science & Technology A 38.6 Web. doi:10.1116/6.0000497.
Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., & Engstrom, James R.. Area-selective atomic layer deposition enabled by competitive adsorption. Journal of Vacuum Science & Technology A, 38 (6). https://doi.org/10.1116/6.0000497
Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., and Engstrom, James R..
"Area-selective atomic layer deposition enabled by competitive adsorption". Journal of Vacuum Science & Technology A 38 (6). Country unknown/Code not available: American Vacuum Society. https://doi.org/10.1116/6.0000497.https://par.nsf.gov/biblio/10201063.
@article{osti_10201063,
place = {Country unknown/Code not available},
title = {Area-selective atomic layer deposition enabled by competitive adsorption},
url = {https://par.nsf.gov/biblio/10201063},
DOI = {10.1116/6.0000497},
abstractNote = {Not Available},
journal = {Journal of Vacuum Science & Technology A},
volume = {38},
number = {6},
publisher = {American Vacuum Society},
author = {Suh, Taewon and Yang, Yan and Sohn, Hae Won and DiStasio, Jr., Robert A. and Engstrom, James R.},
}