Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., and Engstrom, James R. Area-selective atomic layer deposition enabled by competitive adsorption. Journal of Vacuum Science & Technology A 38.6 Web. doi:10.1116/6.0000497.

Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., & Engstrom, James R. Area-selective atomic layer deposition enabled by competitive adsorption. Journal of Vacuum Science & Technology A, 38 (6). https://doi.org/10.1116/6.0000497

Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Jr., Robert A., and Engstrom, James R. "Area-selective atomic layer deposition enabled by competitive adsorption". Journal of Vacuum Science & Technology A 38 (6). Country unknown/Code not available: American Vacuum Society. https://doi.org/10.1116/6.0000497. https://par.nsf.gov/biblio/10201063.

@article{osti_10201063,
place = {Country unknown/Code not available}, title = {Area-selective atomic layer deposition enabled by competitive adsorption}, url = {https://par.nsf.gov/biblio/10201063}, DOI = {10.1116/6.0000497}, abstractNote = {Not Available}, journal = {Journal of Vacuum Science & Technology A}, volume = {38}, number = {6}, publisher = {American Vacuum Society}, author = {Suh, Taewon and Yang, Yan and Sohn, Hae Won and DiStasio, Jr., Robert A. and Engstrom, James R.}, }