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Abstract Raman spectroscopy-based temperature sensing usually tracks the change of Raman wavenumber, linewidth and intensity, and has found very broad applications in characterizing the energy and charge transport in nanomaterials over the last decade. The temperature coefficients of these Raman properties are highly material-dependent, and are subjected to local optical scattering influence. As a result, Raman-based temperature sensing usually suffers quite large uncertainties and has low sensitivity. Here, a novel method based on dual resonance Raman phenomenon is developed to precisely measure the absolute temperature rise of nanomaterial (nm WS 2 film in this work) from 170 to 470 K. A 532 nm laser (2.33 eV photon energy) is used to conduct the Raman experiment. Its photon energy is very close to the excitonic transition energy of WS 2 at temperatures close to room temperature. A parameter, termed resonance Raman ratio (R3) Ω = I A 1g / I E 2g is introduced to combine the temperature effects on resonance Raman scattering for the A 1g and E 2g modes. Ω has a change of more than two orders of magnitude from 177 to 477 K, and such change is independent of film thickness and local optical scattering. It is shown that when Ω is varied by 1%, the temperature probing sensitivity is 0.42 K and 1.16 K at low and high temperatures, respectively. Based on Ω, the in-plane thermal conductivity ( k ) of a ∼25 nm-thick suspended WS 2 film is measured using our energy transport state-resolved Raman (ET-Raman). k is found decreasing from 50.0 to 20.0 Wm −1 K −1 when temperature increases from 170 to 470 K. This agrees with previous experimental and theoretical results and the measurement data using our FET-Raman. The R3 technique provides a very robust and high-sensitivity method for temperature probing of nanomaterials and will have broad applications in nanoscale thermal transport characterization, non-destructive evaluation, and manufacturing monitoring.
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Rigorous prediction of Raman intensity from multi-layer films
In the Raman probing of multilayer thin film materials, the intensity of the measured Raman scattered light will be impacted by the thickness of the thin film layers. The Raman signal intensity will vary non-monotonically with thickness due to interference from the multiple reflections of both the incident laser light and the Raman scattered light of thin film interfaces. Here, a method for calculating the Raman signal intensity from a multilayer thin film system based on the transfer matrix method with a rigorous treatment of the Raman signal generation (discontinuity) is presented. This calculation methodology is valid for any thin film stack with an arbitrary number of layers with arbitrary thicknesses. This approach is applied to several thin film material systems, including silicon-on-sapphire thin films, graphene on Si with a SiO2capping layer, and multilayer MoS2with the presence of a gap between layers and substrate. Different applications where this method can be used in the Raman probing of thin film material properties are discussed.
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- Award ID(s):
- 1930866
- PAR ID:
- 10201071
- Publisher / Repository:
- Optical Society of America
- Date Published:
- Journal Name:
- Optics Express
- Volume:
- 28
- Issue:
- 23
- ISSN:
- 1094-4087; OPEXFF
- Format(s):
- Medium: X Size: Article No. 35272
- Size(s):
- Article No. 35272
- Sponsoring Org:
- National Science Foundation
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