Ban, Yang H., and Bonnecaze, Roger T. Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures. Journal of Vacuum Science & Technology B 39.1 Web. doi:10.1116/6.0000648.

Ban, Yang H., & Bonnecaze, Roger T. Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures. Journal of Vacuum Science & Technology B, 39 (1). https://doi.org/10.1116/6.0000648

Ban, Yang H., and Bonnecaze, Roger T. "Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures". Journal of Vacuum Science & Technology B 39 (1). Country unknown/Code not available: American Vacuum Society. https://doi.org/10.1116/6.0000648. https://par.nsf.gov/biblio/10205946.

@article{osti_10205946,
place = {Country unknown/Code not available}, title = {Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures}, url = {https://par.nsf.gov/biblio/10205946}, DOI = {10.1116/6.0000648}, abstractNote = {Not Available}, journal = {Journal of Vacuum Science & Technology B}, volume = {39}, number = {1}, publisher = {American Vacuum Society}, author = {Ban, Yang H. and Bonnecaze, Roger T.}, }