Damage-Free Atomic Layer Etch of WSe 2 : A Platform for Fabricating Clean Two-Dimensional Devices
- Award ID(s):
- 1752401
- NSF-PAR ID:
- 10214561
- Date Published:
- Journal Name:
- ACS Applied Materials & Interfaces
- Volume:
- 13
- Issue:
- 1
- ISSN:
- 1944-8244
- Page Range / eLocation ID:
- 1930 to 1942
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation