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Microsphere photolithography (MPL) is a fabrication technique that combines the ability to self-assemble arrays of microspheres with the ability of a microsphere to focus light to a photonic jet, in order to create highly ordered nanoscale features in photoresist. This paper presents a model of photoresist exposure with the photonic jet, combining a full-wave electromagnetic model of the microsphere/photoresist interaction with the sequential removal of exposed photoresist by the developer. The model is used to predict the dose curves for the MPL process based on the photoresist thickness, illumination conditions, and development time. After experimental validation, the model provides insight into the process including the resolution, sensitivity, and effects of off-normal illumination. This guides the fabrication of sub-100 nm hole/disk arrays using lift-off, and superposition is shown to predict the geometry for split-ring resonators created using multiple exposures. This model will assist synthesizing fabrication parameters to create large area scalable metasurfaces with sensing and energy management applications.
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Microsphere photolithography patterned nanohole array on an optical fiber
Microsphere Photolithography (MPL) is a nanopatterning technique that utilizes a self-assembled monolayer of microspheres as an optical element to focus incident radiation inside a layer of photoresist. The microspheres produces a sub-diffraction limited photonic-jet on the opposite side of each microsphere from the illumination. When combined with pattern transfer techniques such as etching/lift-off, MPL provides a versatile, low-cost fabrication method for producing hexagonal close-packed metasurfaces. This article investigates the MPL process for creating refractive index (RI) sensors on the cleaved tips of optical fiber. The resonant wavelength of metal elements on the surface is dependent on the local dielectric environment and allows the refractive index of an analyte to be resolved spectrally. A numerical study of hole arrays defined in metal films shows that the waveguide mode provides good sensitivity to the analyte refractive index. This can be readily tuned by adjusting the MPL exposure and the simulation results guide the fabrication of a defect tolerant refractive index sensor on the tip of a fiber tip with a sensitivity of 613 nm/RIU. The conformal nature of the microsphere monolayer simplifies the fabrication process and provides a viable alternative to direct-write techniques such as Focused Ion Beam (FIB) milling
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- Award ID(s):
- 1653792
- PAR ID:
- 10215601
- Date Published:
- Journal Name:
- IEEE Access
- Volume:
- 9
- ISSN:
- 2169-3536
- Page Range / eLocation ID:
- 32627-32633
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Microsphere photolithography (MPL) is an alternative low-cost technique for the large-scale fabrication of periodic structures, such as metasurfaces. This technique utilizes the photonic nanojet generated in the photoresist (PR), by microspheres in near proximity, which are exposed to collimated ultraviolet (UV) flood illumination. In the basic approach, a microsphere array is self-assembled on, or transferred to, the substrate prior to exposure. After exposure, the microspheres are washed away in the development step. The process to recover and clean these microspheres for reuse is complicated. This paper investigates the use of reusable microsphere masks created by fixing the microspheres on a UV transparent support. This is then brought into contact with the photoresist with controlled pressure. There is a trade-off between the quality of the fabricated samples and the wear of the mask determined by the contact pressure. The system is demonstrated using a digital micromirror device (DMD)-based direct-write exposure system to fabricate infrared (IR) metasurfaces. These metasurfaces are characterized and compared to simulation models. Finally, a series of 50 hierarchically patterned IR metasurfaces was fabricated using a single reusable mask. These samples had a <3% coefficient of variance when viewed with a thermal camera. This work shows the potential of mask-based MPL and other contact microlens array-based photolithography techniques for low-cost large-scale fabrication.more » « less
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- Free Publicly Accessible Full Text
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Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1109/ACCESS.2021.3059439
