Thermal stability of microscale additively manufactured copper using pulsed electrodeposition
- Award ID(s):
- 1727539
- PAR ID:
- 10228291
- Date Published:
- Journal Name:
- Materials Letters
- Volume:
- 280
- Issue:
- C
- ISSN:
- 0167-577X
- Page Range / eLocation ID:
- 128584
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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