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1. High-performance electron-blocking-layer-free deep ultraviolet light-emitting diodes implementing a strip-in-a-barrier structure

   https://doi.org/10.1364/OL.400917  

   Velpula, Ravi Teja ; Jain, Barsha ; Velpula, Swetha ; Nguyen, Hoang-Duy ; Nguyen, Hieu Pham Trung ( September 2020 , Optics Letters)

   In this Letter, the electron-blocking-layer (EBL)-free AlGaN ultraviolet (UV) light-emitting diodes (LEDs) using a strip-in-a-barrier structure have been proposed. The quantum barrier (QB) structures are systematically engineered by integrating a 1 nm intrinsic${\mathrm{A}\mathrm{l}}_x{\mathrm{G}\mathrm{a}}_{(1-<\#comment/>x)}\mathrm{N}$strip into the middle of QBs. The resulted structures exhibit significantly reduced electron leakage and improved hole injection into the active region, thus generating higher carrier radiative recombination. Our study shows that the proposed structure improves radiative recombination by$\sim <\#comment/>220\mathrm{\%<\#comment/>}$, reduces electron leakage by$\sim <\#comment/>11$times, and enhances optical power by$\sim <\#comment/>225\mathrm{\%<\#comment/>}$at 60 mA current injection compared to a conventional AlGaN EBL LED structure. Moreover, the EBL-free strip-in-a-barrier UV LED records the maximum internal quantum efficiency (IQE) of$\sim <\#comment/>61.5\mathrm{\%<\#comment/>}$which is$\sim <\#comment/>72\mathrm{\%<\#comment/>}$higher, and IQE droop is$\sim <\#comment/>12.4\mathrm{\%<\#comment/>}$, which is$\sim <\#comment/>333\mathrm{\%<\#comment/>}$less compared to the conventional AlGaN EBL LED structure at$\sim <\#comment/>284.5\mathrm{n}\mathrm{m}$wavelength. Hence, the proposed EBL-free AlGaN LED is the potential solution to enhance the optical power and produce highly efficient UV emitters.

    

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2. Controlled carrier mean free path for the enhanced efficiency of III-nitride deep-ultraviolet light-emitting diodes

   https://doi.org/10.1364/AO.418603  

   Jain, Barsha ; Velpula, Ravi Teja ; Patel, Moulik ; Nguyen, Hieu Pham Trung ( April 2021 , Applied Optics)

   Electron overflow from the active region confines the AlGaN deep-ultraviolet (UV) light-emitting diode (LED) performance. This paper proposes a novel approach to mitigate the electron leakage problem in AlGaN deep-UV LEDs using concave quantum barrier (QB) structures. The proposed QBs suppress the electron leakage by significantly reducing the electron mean free path that improves the electron capturing capability in the active region. Overall, such an engineered structure also enhances the hole injection into the active region, thereby enhancing the radiative recombination in the quantum wells. As a result, our study shows that the proposed structure exhibits an optical power of 9.16 mW at$\sim <\#comment/>284\mathrm{n}\mathrm{m}$wavelength, which is boosted by$\sim <\#comment/>40.5\mathrm{\%<\#comment/>}$compared to conventional AlGaN UV LED operating at 60 mA injection current.

    

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3. Advantages of concave quantum barriers in AlGaN deep ultraviolet light-emitting diodes

   https://doi.org/10.1117/12.2650411  

   Jain, Barsha T. ; Muthu, Manobalasankar ; Velpula, Ravi Teja ; Nguyen, Ngoc T. ; Nguyen, Hieu Pham ( March 2023 , Gallium Nitride Materials and Devices XVIII)

   Morkoç, Hadis ; Fujioka, Hiroshi ; Schwarz, Ulrich T. (Ed.)

   Although AlGaN-based deep ultraviolet (UV) light-emitting diodes (LEDs) have been studied extensively, their quantum efficiency and optical output power still remain extremely low compared to the InGaN-based visible color LEDs. Electron leakage has been identified as one of the most possible reasons for the low internal quantum efficiency (IQE) in AlGaN based UV LEDs. The integration of a p-doped AlGaN electron blocking layer (EBL) or/and increasing the conduction band barrier heights with prompt utilization of higher Al composition quantum barriers (QBs) in the LED could mitigate the electron leakage problem to an extent, but not completely. In this context, we introduce a promising approach to alleviate the electron overflow without using EBL by utilizing graded concave QBs instead of conventional QBs in AlGaN UV LEDs. Overall, the carrier transportation, confinement capability and radiative recombination are significantly improved. As a result, the IQE, and output power of the proposed concave QB LED were enhanced by ~25.4% and ~25.6% compared to the conventional LED for emission at ~254 nm, under 60 mA injection current. 

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4. Demonstration of AlGaN Tunnel Junction p-Down UV Light Emitting Diodes

   Dominic Merwin Xavier, Agnes Maneesha ; Ghosh, Arnob: Rahman ; Allerman, Andrew ; Arafin, Shamsul ; Rajan, Siddharth ( June 2023 , EMC)

   Ultra-violet light emitting diodes (UV-LEDs) and lasers based on the III-Nitride material system are very promising since they enable compact, safe, and efficient solid-state sources of UV light for a range of applications. The primary challenges for UV LEDs are related to the poor conductivity of p-AlGaN layers and the low light extraction efficiency of LED structures. Tunnel junction-based UV LEDs provide a distinct and unique pathway to eliminate several challenges associated with UV LEDs1-4. In this work, we present for the first time, a reversed-polarization (p-down) AlGaN based UV-LED utilizing bottom tunnel junction (BTJ) design. We show that compositional grading enables us to achieve the lowest reported voltage drop of 1.1 V at 20 A/cm2 among transparent AlGaN based tunnel junctions at this Al-composition. Compared to conventional LED design, a p-down structure offers lower voltage drop because the depletion barrier for both holes and electrons is lower due to polarization fields aligning with the depletion field. Furthermore, the bottom tunnel junction also allows us to use polarization grading to realize better p- and n-type doping to improve tunneling transport. The epitaxial structure of the UV-LED was grown by plasma-assisted molecular beam epitaxy (PAMBE) on metal-organic chemical vapor deposition (MOCVD)-grown n-type Al0.3Ga0.7N templates. The transparent TJ was grown using graded n++-Al0.3Ga0.7N→ n++-Al0.4Ga0.6N (Si=3×1020 cm-3) and graded p++-Al0.4Ga0.6N →p++-Al0.3Ga0.7N (Mg=1×1020 cm-3) to take advantage of induced 3D polarization charges. The high number of charges at the tunnel junction region leads to lower depletion width and efficient hole injection to the p-type layer. The UV LED active region consists of three 2.5 nm Al0.2Ga0.8N quantum wells and 7 nm Al0.3Ga0.6N quantum barriers followed by 12 nm of p- Al0.46Ga0.64N electron blocking layer (EBL). The active region was grown on top of the tunnel junction. A similar LED with p-up configuration was also grown to compare the electrical performance. The surface morphology examined by atomic force microscopy (AFM) shows smooth growth features with a surface roughness of 1.9 nm. The dendritic features on the surface are characteristic of high Si doping on the surface. The composition of each layer was extracted from the scan by high resolution x-ray diffraction (HR-XRD). The electrical characteristics of a device show a voltage drop of 4.9 V at 20 A/cm2, which corresponds to a tunnel junction voltage drop of ~ 1.1 V. This is the best lowest voltage for transparent 30% AlGaN tunnel junctions to-date and is comparable with the lowest voltage drop reported previously on non-transparent (InGaN-based) tunnel junctions at similar Al mole fraction AlGaN. On-wafer electroluminescence measurements on patterned light-emitting diodes showed single peak emission wavelength of 325 nm at 100 A/cm2 which corresponds to Al0.2Ga0.8N, confirming that efficient hole injection was achieved within the structure. The device exhibits a wavelength shift from 330 nm to 325 nm with increasing current densities from 10A/cm2 to 100A/cm2. In summary, we have demonstrated a fully transparent bottom AlGaN homojunction tunnel junction that enables p-down reversed polarization ultraviolet light emitting diodes, and has very low voltage drop at the tunnel junction. This work could enable new flexibility in the design of future III-Nitride ultraviolet LEDs and lasers. 

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5. Enhanced hole transport in AlGaN deep ultraviolet light-emitting diodes using a double-sided step graded superlattice electron blocking layer

   https://doi.org/10.1364/JOSAB.399773  

   Jain, Barsha ; Velpula, Ravi Teja ; Velpula, Swetha ; Nguyen, Hoang-Duy ; Nguyen, Hieu Pham Trung ( August 2020 , Journal of the Optical Society of America B)

   In this paper, deep ultraviolet AlGaN light-emitting diodes (LEDs) with a novel double-sided step graded superlattice (DSGS) electron blocking layer (EBL) instead of a conventional EBL have been proposed for$\sim <\#comment/>254\mathrm{n}\mathrm{m}$wavelength emission. The enhanced carrier transport in the DSGS structure results in reduced electron leakage into the$p$-region, improved hole activation and hole injection, and enhanced output power and external quantum efficiency. The calculations show that output power of the DSGS structure is$\sim <\#comment/>3.56$times higher and electron leakage is$\sim <\#comment/>12$times lower, compared to the conventional structure. Moreover, the efficiency droop at 60 mA in the DSGS LED was found to be$\sim <\#comment/>9.1\mathrm{\%<\#comment/>}$, which is$\sim <\#comment/>4.5$times lower than the regular LED structure.

    

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