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Title: Computational fluid dynamics modeling of a new high-pressure chemical vapor deposition reactor design
Award ID(s):
1726395
PAR ID:
10234848
Author(s) / Creator(s):
;
Date Published:
Journal Name:
Journal of Crystal Growth
Volume:
566-567
Issue:
C
ISSN:
0022-0248
Page Range / eLocation ID:
126155
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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