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Title: Engineering the Electronic, Thermoelectric, and Excitonic Properties of Two-Dimensional Group-III Nitrides through Alloying for Optoelectronic Devices (B 1–x Al x N, Al 1–x Ga x N, and Ga 1–x In x N)
Award ID(s):
1726213
PAR ID:
10235762
Author(s) / Creator(s):
; ;
Date Published:
Journal Name:
ACS Applied Materials & Interfaces
Volume:
12
Issue:
41
ISSN:
1944-8244
Page Range / eLocation ID:
46416 to 46428
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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  1. Secondary‐ion mass spectrometry (SIMS) is used to determine impurity concentrations of carbon and oxygen in two scandium‐containing nitride semiconductor multilayer heterostructures: ScxGa1−xN/GaN and ScxAl1−xN/AlN grown by molecular beam epitaxy (MBE). In the ScxGa1−xN/GaN heterostructure grown in metal‐rich conditions on GaN–SiC template substrates with Sc contents up to 28 at%, the oxygen concentration is found to be below 1 × 1019 cm−3, with an increase directly correlated with the scandium content. In the ScxAl1−xN–AlN heterostructure grown in nitrogen‐rich conditions on AlN–Al2O3template substrates with Sc contents up to 26 at%, the oxygen concentration is found to be between 1019and 1021 cm−3, again directly correlated with the Sc content. The increase in oxygen and carbon takes place during the deposition of scandium‐alloyed layers. 
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