Lin, Zhu, Li, Zhilin, Deng, Haoyun, Liu, Tianhan, Shi, Gang, Bonesteel, Nicholas, Schlottmann, Pedro, Li, Yongqing, and Xiong, Peng. Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator. Retrieved from https://par.nsf.gov/biblio/10250870. Physical Review B 102.14 Web. doi:10.1103/PhysRevB.102.144518.

Lin, Zhu, Li, Zhilin, Deng, Haoyun, Liu, Tianhan, Shi, Gang, Bonesteel, Nicholas, Schlottmann, Pedro, Li, Yongqing, & Xiong, Peng. Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator. Physical Review B, 102 (14). Retrieved from https://par.nsf.gov/biblio/10250870. https://doi.org/10.1103/PhysRevB.102.144518

Lin, Zhu, Li, Zhilin, Deng, Haoyun, Liu, Tianhan, Shi, Gang, Bonesteel, Nicholas, Schlottmann, Pedro, Li, Yongqing, and Xiong, Peng. "Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator". Physical Review B 102 (14). Country unknown/Code not available. https://doi.org/10.1103/PhysRevB.102.144518. https://par.nsf.gov/biblio/10250870.

@article{osti_10250870,
place = {Country unknown/Code not available}, title = {Giant enhancement of the in-plane critical field for thin Al films via proximity coupling to a topological insulator}, url = {https://par.nsf.gov/biblio/10250870}, DOI = {10.1103/PhysRevB.102.144518}, abstractNote = {}, journal = {Physical Review B}, volume = {102}, number = {14}, author = {Lin, Zhu and Li, Zhilin and Deng, Haoyun and Liu, Tianhan and Shi, Gang and Bonesteel, Nicholas and Schlottmann, Pedro and Li, Yongqing and Xiong, Peng}, editor = {null} }