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The DOI auto-population feature in the Public Access Repository (PAR) will be unavailable from 4:00 PM ET on Tuesday, July 8 until 4:00 PM ET on Wednesday, July 9 due to scheduled maintenance. We apologize for the inconvenience caused.


Title: Dielectric, energy storage, and loss study of antiferroelectric-like Al-doped HfO 2 thin films
Award ID(s):
1634955
PAR ID:
10274467
Author(s) / Creator(s):
; ; ; ; ;
Date Published:
Journal Name:
Applied Physics Letters
Volume:
117
Issue:
22
ISSN:
0003-6951
Page Range / eLocation ID:
221104
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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