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Ganesan, Jeya Prakash, Dev, Durjoy, Krishnaprasad, Adithi, Feit, Corbin, Moser, Daniel, Kanjolia, Ravindra K., Roy, Tania, and Banerjee, Parag. Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO 2 films using VCl 4 and water. Retrieved from https://par.nsf.gov/biblio/10283487. Applied Physics Letters 118.26 Web. doi:10.1063/5.0053566.
Ganesan, Jeya Prakash, Dev, Durjoy, Krishnaprasad, Adithi, Feit, Corbin, Moser, Daniel, Kanjolia, Ravindra K., Roy, Tania, and Banerjee, Parag.
"Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO 2 films using VCl 4 and water". Applied Physics Letters 118 (26). Country unknown/Code not available. https://doi.org/10.1063/5.0053566.https://par.nsf.gov/biblio/10283487.
@article{osti_10283487,
place = {Country unknown/Code not available},
title = {Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO 2 films using VCl 4 and water},
url = {https://par.nsf.gov/biblio/10283487},
DOI = {10.1063/5.0053566},
abstractNote = {},
journal = {Applied Physics Letters},
volume = {118},
number = {26},
author = {Ganesan, Jeya Prakash and Dev, Durjoy and Krishnaprasad, Adithi and Feit, Corbin and Moser, Daniel and Kanjolia, Ravindra K. and Roy, Tania and Banerjee, Parag},
editor = {null}
}
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