Title: Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO 2 films using VCl 4 and water
Award ID(s):
1908167 1845331
PAR ID:
10283487
Author(s) / Creator(s):
; ; ; ; ; ; ;
Date Published:
Journal Name:
Applied Physics Letters
Volume:
118
Issue:
26
ISSN:
0003-6951
Page Range / eLocation ID:
261902
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
More Like this
  1. null (Ed.)