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- Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon
Title:
Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon
- NSF-PAR ID:
- 10284205
- Author(s) / Creator(s):
- Wagenpfeil, M.; Ziegler, T.; Schneider, J.; Fieguth, A.; Murra, M.; Schulte, D.; Althueser, L.; Huhmann, C.; Weinheimer, C.; Michel, T.; Anton, G.; Adhikari, G.; Al Kharusi, S.; Angelico, E.; Arnquist, I.J.; Badhrees, I.; Bane, J.; Beck, D.; Belov, V.; Bhatta, T.more » ; Bolotnikov, A.; Breur, P.A.; Brodsky, J.P.; Brown, E.; Brunner, T.; Caden, E.; Cao, G.F.; Chambers, C.; Chana, B.; Charlebois, S.A.; Chernyak, D.; Chiu, M.; Cleveland, B.; Craycraft, A.; Daniels, T.; Darroch, L.; Der Mesrobian-Kabakian, A.; de St. Croix, A.; Deslandes, K.; DeVoe, R.; Di Vacri, M.L.; Dolinski, M.J.; Echevers, J.; Elbeltagi, M.; Fabris, L.; Fairbank, D.; Fairbank, W.; Farine, J.; Ferrara, S.; Feyzbakhsh, S.; Gallina, G.; Gautam, P.; Giacomini, G.; Gingras, C.; Goeldi, D.; Gorham, A.; Gornea, R.; Gratta, G.; Hansen, E.V.; Hardy, C.A.; Harouaka, K.; Heffner, M.; Hoppe, E.W.; House, A.; Hughes, M.; Iverson, A.; Jamil, A.; Jewell, M.; Karelin, A.; Kaufman, L.J.; Krücken, R.; Kuchenkov, A.; Kumar, K.S.; Lan, Y.; Larson, A.; Leach, K.G.; Leonard, D.S.; Li, G.; Li, S.; Li, Z.; Licciardi, C.; Lindsay, R.; MacLellan, R.; Martel-Dion, P.; Massacret, N.; McElroy, T.; Medina Peregrina, M.; Mong, B.; Moore, D.C.; Murray, K.; Nattress, J.; Natzke, C.R.; Newby, R.J.; Nolet, F.; Nusair, O.; Nzobadila Ondze, J.C.; Odgers, K.; Odian, A.; Orrell, J.L.; Ortega, G.S.; Ostrovskiy, I.; Overman, C.T.; Parent, S.; Piepke, A.; Pocar, A.; Pratte, J.-F.; Raguzin, E.; Ramonnye, G.J.; Rasiwala, H.; Rescia, S.; Retière, F.; Richard, C.; Richman, M.; Ringuette, J.; Robinson, A.; Rossignol, T.; Rowson, P.C.; Roy, N.; Saldanha, R.; Sangiorgio, S.; Soma, A.K.; Spadoni, F.; Stekhanov, V.; Stiegler, T.; Tarka, M.; Thibado, S.; Tidball, A.; Todd, J.; Totev, T.; Triambak, S.; Tsang, R.; Vachon, F.; Veeraraghavan, V.; Viel, S.; Vivo-Vilches, C.; Walent, M.; Wichoski, U.; Worcester, M.; Wu, S.X.; Xia, Q.; Yan, W.; Yang, L.; Zeldovich, O. « less
- Date Published:
- Journal Name:
- Journal of Instrumentation
- Volume:
- 16
- Issue:
- 08
- ISSN:
- 1748-0221
- Page Range / eLocation ID:
- P08002
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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- Accepted Manuscript1.0
- Journal Article:
- https://doi.org/10.1088/1748-0221/16/08/P08002
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!- Citation Formats
- MLA
Cite: MLA FormatWagenpfeil, M., Ziegler, T., Schneider, J., Fieguth, A., Murra, M., Schulte, D., Althueser, L., Huhmann, C., Weinheimer, C., Michel, T., Anton, G., Adhikari, G., Al Kharusi, S., Angelico, E., Arnquist, I.J., Badhrees, I., Bane, J., Beck, D., Belov, V., Bhatta, T., Bolotnikov, A., Breur, P.A., Brodsky, J.P., Brown, E., Brunner, T., Caden, E., Cao, G.F., Chambers, C., Chana, B., Charlebois, S.A., Chernyak, D., Chiu, M., Cleveland, B., Craycraft, A., Daniels, T., Darroch, L., Der Mesrobian-Kabakian, A., de St. Croix, A., Deslandes, K., DeVoe, R., Di Vacri, M.L., Dolinski, M.J., Echevers, J., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Gallina, G., Gautam, P., Giacomini, G., Gingras, C., Goeldi, D., Gorham, A., Gornea, R., Gratta, G., Hansen, E.V., Hardy, C.A., Harouaka, K., Heffner, M., Hoppe, E.W., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M., Karelin, A., Kaufman, L.J., Krücken, R., Kuchenkov, A., Kumar, K.S., Lan, Y., Larson, A., Leach, K.G., Leonard, D.S., Li, G., Li, S., Li, Z., Licciardi, C., Lindsay, R., MacLellan, R., Martel-Dion, P., Massacret, N., McElroy, T., Medina Peregrina, M., Mong, B., Moore, D.C., Murray, K., Nattress, J., Natzke, C.R., Newby, R.J., Nolet, F., Nusair, O., Nzobadila Ondze, J.C., Odgers, K., Odian, A., Orrell, J.L., Ortega, G.S., Ostrovskiy, I., Overman, C.T., Parent, S., Piepke, A., Pocar, A., Pratte, J.-F., Raguzin, E., Ramonnye, G.J., Rasiwala, H., Rescia, S., Retière, F., Richard, C., Richman, M., Ringuette, J., Robinson, A., Rossignol, T., Rowson, P.C., Roy, N., Saldanha, R., Sangiorgio, S., Soma, A.K., Spadoni, F., Stekhanov, V., Stiegler, T., Tarka, M., Thibado, S., Tidball, A., Todd, J., Totev, T., Triambak, S., Tsang, R., Vachon, F., Veeraraghavan, V., Viel, S., Vivo-Vilches, C., Walent, M., Wichoski, U., Worcester, M., Wu, S.X., Xia, Q., Yan, W., Yang, L., and Zeldovich, O. Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon. Retrieved from https://par.nsf.gov/biblio/10284205. Journal of Instrumentation 16.08 Web. doi:10.1088/1748-0221/16/08/P08002.
- APA
Cite: APA FormatWagenpfeil, M., Ziegler, T., Schneider, J., Fieguth, A., Murra, M., Schulte, D., Althueser, L., Huhmann, C., Weinheimer, C., Michel, T., Anton, G., Adhikari, G., Al Kharusi, S., Angelico, E., Arnquist, I.J., Badhrees, I., Bane, J., Beck, D., Belov, V., Bhatta, T., Bolotnikov, A., Breur, P.A., Brodsky, J.P., Brown, E., Brunner, T., Caden, E., Cao, G.F., Chambers, C., Chana, B., Charlebois, S.A., Chernyak, D., Chiu, M., Cleveland, B., Craycraft, A., Daniels, T., Darroch, L., Der Mesrobian-Kabakian, A., de St. Croix, A., Deslandes, K., DeVoe, R., Di Vacri, M.L., Dolinski, M.J., Echevers, J., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Gallina, G., Gautam, P., Giacomini, G., Gingras, C., Goeldi, D., Gorham, A., Gornea, R., Gratta, G., Hansen, E.V., Hardy, C.A., Harouaka, K., Heffner, M., Hoppe, E.W., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M., Karelin, A., Kaufman, L.J., Krücken, R., Kuchenkov, A., Kumar, K.S., Lan, Y., Larson, A., Leach, K.G., Leonard, D.S., Li, G., Li, S., Li, Z., Licciardi, C., Lindsay, R., MacLellan, R., Martel-Dion, P., Massacret, N., McElroy, T., Medina Peregrina, M., Mong, B., Moore, D.C., Murray, K., Nattress, J., Natzke, C.R., Newby, R.J., Nolet, F., Nusair, O., Nzobadila Ondze, J.C., Odgers, K., Odian, A., Orrell, J.L., Ortega, G.S., Ostrovskiy, I., Overman, C.T., Parent, S., Piepke, A., Pocar, A., Pratte, J.-F., Raguzin, E., Ramonnye, G.J., Rasiwala, H., Rescia, S., Retière, F., Richard, C., Richman, M., Ringuette, J., Robinson, A., Rossignol, T., Rowson, P.C., Roy, N., Saldanha, R., Sangiorgio, S., Soma, A.K., Spadoni, F., Stekhanov, V., Stiegler, T., Tarka, M., Thibado, S., Tidball, A., Todd, J., Totev, T., Triambak, S., Tsang, R., Vachon, F., Veeraraghavan, V., Viel, S., Vivo-Vilches, C., Walent, M., Wichoski, U., Worcester, M., Wu, S.X., Xia, Q., Yan, W., Yang, L., & Zeldovich, O. Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon. Journal of Instrumentation, 16 (08). Retrieved from https://par.nsf.gov/biblio/10284205. https://doi.org/10.1088/1748-0221/16/08/P08002
- Chicago
Cite: Chicago FormatWagenpfeil, M., Ziegler, T., Schneider, J., Fieguth, A., Murra, M., Schulte, D., Althueser, L., Huhmann, C., Weinheimer, C., Michel, T., Anton, G., Adhikari, G., Al Kharusi, S., Angelico, E., Arnquist, I.J., Badhrees, I., Bane, J., Beck, D., Belov, V., Bhatta, T., Bolotnikov, A., Breur, P.A., Brodsky, J.P., Brown, E., Brunner, T., Caden, E., Cao, G.F., Chambers, C., Chana, B., Charlebois, S.A., Chernyak, D., Chiu, M., Cleveland, B., Craycraft, A., Daniels, T., Darroch, L., Der Mesrobian-Kabakian, A., de St. Croix, A., Deslandes, K., DeVoe, R., Di Vacri, M.L., Dolinski, M.J., Echevers, J., Elbeltagi, M., Fabris, L., Fairbank, D., Fairbank, W., Farine, J., Ferrara, S., Feyzbakhsh, S., Gallina, G., Gautam, P., Giacomini, G., Gingras, C., Goeldi, D., Gorham, A., Gornea, R., Gratta, G., Hansen, E.V., Hardy, C.A., Harouaka, K., Heffner, M., Hoppe, E.W., House, A., Hughes, M., Iverson, A., Jamil, A., Jewell, M., Karelin, A., Kaufman, L.J., Krücken, R., Kuchenkov, A., Kumar, K.S., Lan, Y., Larson, A., Leach, K.G., Leonard, D.S., Li, G., Li, S., Li, Z., Licciardi, C., Lindsay, R., MacLellan, R., Martel-Dion, P., Massacret, N., McElroy, T., Medina Peregrina, M., Mong, B., Moore, D.C., Murray, K., Nattress, J., Natzke, C.R., Newby, R.J., Nolet, F., Nusair, O., Nzobadila Ondze, J.C., Odgers, K., Odian, A., Orrell, J.L., Ortega, G.S., Ostrovskiy, I., Overman, C.T., Parent, S., Piepke, A., Pocar, A., Pratte, J.-F., Raguzin, E., Ramonnye, G.J., Rasiwala, H., Rescia, S., Retière, F., Richard, C., Richman, M., Ringuette, J., Robinson, A., Rossignol, T., Rowson, P.C., Roy, N., Saldanha, R., Sangiorgio, S., Soma, A.K., Spadoni, F., Stekhanov, V., Stiegler, T., Tarka, M., Thibado, S., Tidball, A., Todd, J., Totev, T., Triambak, S., Tsang, R., Vachon, F., Veeraraghavan, V., Viel, S., Vivo-Vilches, C., Walent, M., Wichoski, U., Worcester, M., Wu, S.X., Xia, Q., Yan, W., Yang, L., and Zeldovich, O. "Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon". Journal of Instrumentation 16 (08). Country unknown/Code not available. https://doi.org/10.1088/1748-0221/16/08/P08002. https://par.nsf.gov/biblio/10284205.
- BibTeX
Cite: BibTeX Format@article{osti_10284205,
place = {Country unknown/Code not available}, title = {Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon}, url = {https://par.nsf.gov/biblio/10284205}, DOI = {10.1088/1748-0221/16/08/P08002}, abstractNote = {}, journal = {Journal of Instrumentation}, volume = {16}, number = {08}, author = {Wagenpfeil, M. and Ziegler, T. and Schneider, J. and Fieguth, A. and Murra, M. and Schulte, D. and Althueser, L. and Huhmann, C. and Weinheimer, C. and Michel, T. and Anton, G. and Adhikari, G. and Al Kharusi, S. and Angelico, E. and Arnquist, I.J. and Badhrees, I. and Bane, J. and Beck, D. and Belov, V. and Bhatta, T. and Bolotnikov, A. and Breur, P.A. and Brodsky, J.P. and Brown, E. and Brunner, T. and Caden, E. and Cao, G.F. and Chambers, C. and Chana, B. and Charlebois, S.A. and Chernyak, D. and Chiu, M. and Cleveland, B. and Craycraft, A. and Daniels, T. and Darroch, L. and Der Mesrobian-Kabakian, A. and de St. Croix, A. and Deslandes, K. and DeVoe, R. and Di Vacri, M.L. and Dolinski, M.J. and Echevers, J. and Elbeltagi, M. and Fabris, L. and Fairbank, D. and Fairbank, W. and Farine, J. and Ferrara, S. and Feyzbakhsh, S. and Gallina, G. and Gautam, P. and Giacomini, G. and Gingras, C. and Goeldi, D. and Gorham, A. and Gornea, R. and Gratta, G. and Hansen, E.V. and Hardy, C.A. and Harouaka, K. and Heffner, M. and Hoppe, E.W. and House, A. and Hughes, M. and Iverson, A. and Jamil, A. and Jewell, M. and Karelin, A. and Kaufman, L.J. and Krücken, R. and Kuchenkov, A. and Kumar, K.S. and Lan, Y. and Larson, A. and Leach, K.G. and Leonard, D.S. and Li, G. and Li, S. and Li, Z. and Licciardi, C. and Lindsay, R. and MacLellan, R. and Martel-Dion, P. and Massacret, N. and McElroy, T. and Medina Peregrina, M. and Mong, B. and Moore, D.C. and Murray, K. and Nattress, J. and Natzke, C.R. and Newby, R.J. and Nolet, F. and Nusair, O. and Nzobadila Ondze, J.C. and Odgers, K. and Odian, A. and Orrell, J.L. and Ortega, G.S. and Ostrovskiy, I. and Overman, C.T. and Parent, S. and Piepke, A. and Pocar, A. and Pratte, J.-F. and Raguzin, E. and Ramonnye, G.J. and Rasiwala, H. and Rescia, S. and Retière, F. and Richard, C. and Richman, M. and Ringuette, J. and Robinson, A. and Rossignol, T. and Rowson, P.C. and Roy, N. and Saldanha, R. and Sangiorgio, S. and Soma, A.K. and Spadoni, F. and Stekhanov, V. and Stiegler, T. and Tarka, M. and Thibado, S. and Tidball, A. and Todd, J. and Totev, T. and Triambak, S. and Tsang, R. and Vachon, F. and Veeraraghavan, V. and Viel, S. and Vivo-Vilches, C. and Walent, M. and Wichoski, U. and Worcester, M. and Wu, S.X. and Xia, Q. and Yan, W. and Yang, L. and Zeldovich, O.}, editor = {null} }
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