Estrada, Tania G., and Walker, Amy V. Cuprous or cupric? How substrate polarity can select for different phases of copper sulfide films in chemical bath deposition. Retrieved from https://par.nsf.gov/biblio/10302219. The Journal of Chemical Physics 154.14 Web. doi:10.1063/5.0046062.

Estrada, Tania G., & Walker, Amy V. Cuprous or cupric? How substrate polarity can select for different phases of copper sulfide films in chemical bath deposition. The Journal of Chemical Physics, 154 (14). Retrieved from https://par.nsf.gov/biblio/10302219. https://doi.org/10.1063/5.0046062

Estrada, Tania G., and Walker, Amy V. "Cuprous or cupric? How substrate polarity can select for different phases of copper sulfide films in chemical bath deposition". The Journal of Chemical Physics 154 (14). Country unknown/Code not available. https://doi.org/10.1063/5.0046062. https://par.nsf.gov/biblio/10302219.

@article{osti_10302219,
place = {Country unknown/Code not available}, title = {Cuprous or cupric? How substrate polarity can select for different phases of copper sulfide films in chemical bath deposition}, url = {https://par.nsf.gov/biblio/10302219}, DOI = {10.1063/5.0046062}, abstractNote = {}, journal = {The Journal of Chemical Physics}, volume = {154}, number = {14}, author = {Estrada, Tania G. and Walker, Amy V.}, editor = {null} }