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Title: Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features
NSF-PAR ID:
10306227
Author(s) / Creator(s):
 ;  ;  
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology B
Volume:
39
Issue:
6
ISSN:
2166-2746
Page Range / eLocation ID:
Article No. 064003
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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