Fromel, Michele, Crisci, Raymond L., Sankhe, Chinmay S., Reifsnyder Hickey, Danielle, Tighe, Timothy B., Gomez, Esther W., and Pester, Christian W.. User-friendly chemical patterning with digital light projection polymer brush photolithography. Retrieved from https://par.nsf.gov/biblio/10323273. European Polymer Journal 158.C Web. doi:10.1016/j.eurpolymj.2021.110652.

Fromel, Michele, Crisci, Raymond L., Sankhe, Chinmay S., Reifsnyder Hickey, Danielle, Tighe, Timothy B., Gomez, Esther W., & Pester, Christian W.. User-friendly chemical patterning with digital light projection polymer brush photolithography. European Polymer Journal, 158 (C). Retrieved from https://par.nsf.gov/biblio/10323273. https://doi.org/10.1016/j.eurpolymj.2021.110652

Fromel, Michele, Crisci, Raymond L., Sankhe, Chinmay S., Reifsnyder Hickey, Danielle, Tighe, Timothy B., Gomez, Esther W., and Pester, Christian W.. "User-friendly chemical patterning with digital light projection polymer brush photolithography". European Polymer Journal 158 (C). Country unknown/Code not available. https://doi.org/10.1016/j.eurpolymj.2021.110652. https://par.nsf.gov/biblio/10323273.

@article{osti_10323273,
place = {Country unknown/Code not available}, title = {User-friendly chemical patterning with digital light projection polymer brush photolithography}, url = {https://par.nsf.gov/biblio/10323273}, DOI = {10.1016/j.eurpolymj.2021.110652}, abstractNote = {}, journal = {European Polymer Journal}, volume = {158}, number = {C}, author = {Fromel, Michele and Crisci, Raymond L. and Sankhe, Chinmay S. and Reifsnyder Hickey, Danielle and Tighe, Timothy B. and Gomez, Esther W. and Pester, Christian W.}, }