We have explored the potential of poly(dopamine) (PDA) thin films as versatile, high resolution conformal photoresists, using catalytic photoreduction of silver ions to micropattern the film. The combination of photosensitivity, biocompatibilty, and straightforward deposition under mild conditions into thin (~45 nm) conformal coatings on nearly any material makes PDA films of interest in lithographic patterning on highly non-planar geometries as well as on soft and biological materials where standard photoresists cannot be used. PDA and poly(norepinephrine) (PNE) films deposited with a standard autoxidation process were investigated along with PDA film deposited with a fast oxidation (FO) technique. Notably, we find that non-specific deposition of silver off the lithographic pattern is strongly suppressed in PNE and nearly absent in FO-PDA films, which makes very high contrast lithography possible. We attribute this to a lower ratio of catechol to quinone moieties in these films compared to standard PDA films. PNE and FO-PDA films exhibit smaller silver grain sizes (<40 nm) compared to standard PDA films, where grains are up to 200 nm in size. We demonstrate laser-scanning lithography patterns at 1.7 \um spatial resolution, near the optical resolution limit of the experiment. Continuous silver films can readily be deposited on PDA, PNE, and FO-PDA with blue (\lambda = 473 nm) and UV-A (375 nm) light, but not with green (515 nm) light. The UV light at lower intensities deposits silver several times faster than the blue light, but also degrades the deposited silver at high light intensities. Silver films deposited in this way reach the percolation threshold at optical doses (at \lambda = 473}nm) in the range of 10-50 kJ/cm^2 and SEM images of the films appear nearly pinhole free at comparable doses.
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Structural color printing via polymer-assisted photochemical deposition
Abstract Structural color printings have broad applications due to their advantages of long-term sustainability, eco-friendly manufacturing, and ultra-high resolution. However, most of them require costly and time-consuming fabrication processes from nanolithography to vacuum deposition and etching. Here, we demonstrate a new color printing technology based on polymer-assisted photochemical metal deposition (PPD), a room temperature, ambient, and additive manufacturing process without requiring heating, vacuum deposition or etching. The PPD-printed silver films comprise densely aggregated silver nanoparticles filled with a small amount (estimated <20% volume) of polymers, producing a smooth surface (roughness 2.5 nm) even better than vacuum-deposited silver films (roughness 2.8 nm) at ~4 nm thickness. Further, the printed composite films have a much larger effective refractive index n (~1.90) and a smaller extinction coefficient k (~0.92) than PVD ones in the visible wavelength range (400 to 800 nm), therefore modulating the surface reflection and the phase accumulation. The capability of PPD in printing both ultra-thin (~5 nm) composite films and highly reflective thicker film greatly benefit the design and construction of multilayered Fabry–Perot (FP) cavity structures to exhibit vivid and saturated colors. We demonstrated programmed printing of complex pictures of different color schemes at a high spatial resolution of ~6.5 μm by three-dimensionally modulating the top composite film geometries and dielectric spacer thicknesses (75 to 200 nm). Finally, PPD-based color picture printing is demonstrated on a wide range of substrates, including glass, PDMS, and plastic, proving its broad potential in future applications from security labeling to color displays.
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- PAR ID:
- 10338855
- Date Published:
- Journal Name:
- Light: Science & Applications
- Volume:
- 11
- Issue:
- 1
- ISSN:
- 2047-7538
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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