Syamala Rao, M.G., Chandra Sekhar Reddy, K., Meza-Arroyo, J., Murthy, Lakshmi N.S., Daunis, Trey B., Pintor-Monroy, Maria Isabel, Hsu, Julia W.P., and Ramirez-Bon, R. ZrHfO2-PMMA hybrid dielectric layers for high-performance all solution-processed In2O3-based TFTs. Retrieved from https://par.nsf.gov/biblio/10342507. Materials Research Bulletin 150.C Web. doi:10.1016/j.materresbull.2022.111768.

Syamala Rao, M.G., Chandra Sekhar Reddy, K., Meza-Arroyo, J., Murthy, Lakshmi N.S., Daunis, Trey B., Pintor-Monroy, Maria Isabel, Hsu, Julia W.P., & Ramirez-Bon, R. ZrHfO2-PMMA hybrid dielectric layers for high-performance all solution-processed In2O3-based TFTs. Materials Research Bulletin, 150 (C). Retrieved from https://par.nsf.gov/biblio/10342507. https://doi.org/10.1016/j.materresbull.2022.111768

Syamala Rao, M.G., Chandra Sekhar Reddy, K., Meza-Arroyo, J., Murthy, Lakshmi N.S., Daunis, Trey B., Pintor-Monroy, Maria Isabel, Hsu, Julia W.P., and Ramirez-Bon, R. "ZrHfO2-PMMA hybrid dielectric layers for high-performance all solution-processed In2O3-based TFTs". Materials Research Bulletin 150 (C). Country unknown/Code not available. https://doi.org/10.1016/j.materresbull.2022.111768. https://par.nsf.gov/biblio/10342507.

@article{osti_10342507,
place = {Country unknown/Code not available}, title = {ZrHfO2-PMMA hybrid dielectric layers for high-performance all solution-processed In2O3-based TFTs}, url = {https://par.nsf.gov/biblio/10342507}, DOI = {10.1016/j.materresbull.2022.111768}, abstractNote = {}, journal = {Materials Research Bulletin}, volume = {150}, number = {C}, author = {Syamala Rao, M.G. and Chandra Sekhar Reddy, K. and Meza-Arroyo, J. and Murthy, Lakshmi N.S. and Daunis, Trey B. and Pintor-Monroy, Maria Isabel and Hsu, Julia W.P. and Ramirez-Bon, R.}, }