Thapaliya, T. R., Yoo, Timothy, Hurtado Parra, Sebastian, Arndt, Nathan D., Need, R. F., Kikkawa, James M., Kim, Honggyu, and Huang, S. X. High-quality epitaxial thin films of topological kagome metal CoSn by magnetron sputtering. Applied Physics Letters 119.20 Web. doi:10.1063/5.0071115.

Thapaliya, T. R., Yoo, Timothy, Hurtado Parra, Sebastian, Arndt, Nathan D., Need, R. F., Kikkawa, James M., Kim, Honggyu, & Huang, S. X. High-quality epitaxial thin films of topological kagome metal CoSn by magnetron sputtering. Applied Physics Letters, 119 (20). https://doi.org/10.1063/5.0071115

Thapaliya, T. R., Yoo, Timothy, Hurtado Parra, Sebastian, Arndt, Nathan D., Need, R. F., Kikkawa, James M., Kim, Honggyu, and Huang, S. X. "High-quality epitaxial thin films of topological kagome metal CoSn by magnetron sputtering". Applied Physics Letters 119 (20). Country unknown/Code not available: American Institute of Physics. https://doi.org/10.1063/5.0071115. https://par.nsf.gov/biblio/10360300.

@article{osti_10360300,
place = {Country unknown/Code not available}, title = {High-quality epitaxial thin films of topological kagome metal CoSn by magnetron sputtering}, url = {https://par.nsf.gov/biblio/10360300}, DOI = {10.1063/5.0071115}, abstractNote = {Not Available}, journal = {Applied Physics Letters}, volume = {119}, number = {20}, publisher = {American Institute of Physics}, author = {Thapaliya, T. R. and Yoo, Timothy and Hurtado Parra, Sebastian and Arndt, Nathan D. and Need, R. F. and Kikkawa, James M. and Kim, Honggyu and Huang, S. X.}, }